Author:
Hariu T.,Takenaka K.,Shibuya S.,Komatsu Y.,Shibata Y.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Cited by
25 articles.
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1. Chemical Vapor Deposition Under Plasma Conditions;Film Deposition by Plasma Techniques;1992
2. Plasma-Enhanced Chemical Vapor Deposition;Thin Film Processes;1991
3. Plasma–material interactions;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1990-05
4. References;Thin Films by Chemical Vapour Deposition;1990
5. Low‐temperature surface cleaning method using low‐energy reactive ionized species;Journal of Applied Physics;1989-01-15