Synergy between dodecylbenzenesulfonic acid and isomeric alcohol polyoxyethylene ether for nano-scale scratch reduction in copper chemical mechanical polishing-Reference-Cited by-同舟云学术

Synergy between dodecylbenzenesulfonic acid and isomeric alcohol polyoxyethylene ether for nano-scale scratch reduction in copper chemical mechanical polishing

Published:2020-12 Issue: Volume:152 Page:106576
ISSN:0301-679X
Container-title:Tribology International
language:en
Short-container-title:Tribology International

Author:

Luo Chong,Xu Yi,Zeng Nengyuan,Ma Tengda,Wang Chenwei,Liu Yuling

Funder

National Major Science and Technology Projects of China

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanical Engineering,Mechanics of Materials

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