Author:
Hsia Feng-Chun,Elam Fiona M.,Bonn Daniel,Weber Bart,Franklin Steve E.
Funder
Advanced Research Center for Nanolithography
University of Amsterdam (UvA), the Netherlands
Vrije University Amsterdam (VU), the Netherlands
Dutch Research Council
semiconductor equipment manufacturer ASML
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanical Engineering,Mechanics of Materials
Cited by
23 articles.
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