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Nonlinear model predictive control of a multiscale thin film deposition process using artificial neural networks

  • Published:2019-11 Issue: Volume:207 Page:1230-1245
  • ISSN:0009-2509
  • Container-title:Chemical Engineering Science
  • language:en
  • Short-container-title:Chemical Engineering Science

Author:

Kimaev Grigoriy,Ricardez-Sandoval Luis A.

Funder

Natural Sciences and Engineering Research Council of Canada

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference98 articles.

1. A reduced-basis discretization method for chemical vapor deposition reactor simulation;Adomaitis;Math. Comput. Modell.,2003

2. Multiscale modeling and optimization of an atomic layer deposition process for nanomanufacturing applications;Adomaitis,2010

3. Development of a multiscale model for an atomic layer deposition process;Adomaitis;J. Cryst. Growth,2010

4. Population balance model-based hybrid neural network for a pharmaceutical milling process;Akkisetty;J. Pharm. Innovat.,2010

5. Nonlinear adaptive model predictive control based on self-correcting neural network models;Alexandridis;AIChE J.,2005

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