Influence of low-energy bombardment of an RF magnetron sputtering discharge on texture formation and stress in ZnO films
Author:
Publisher
Elsevier BV
Subject
Nuclear Energy and Engineering,General Materials Science,Nuclear and High Energy Physics
Reference22 articles.
1. Correlation between the ion bombardment during film growth of Pd films and their structural and electrical properties
2. The influence of discharge current on the intrinsic stress in Mo films deposited using cylindrical and planar magnetron sputtering sources
3. Effect of ion bombardment during deposition on the x‐ray microstructure of thin silver films
4. Summary Abstract: Non‐bulk‐like physical properties of thin films due to ion bombardment during film growth
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1. Characteristics of surface acoustic waves excited by (1120) zno films deposited on R-sapphire substrates;IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control;2013-06
2. Effect of the substrate temperature on the properties of Ga-doped ZnO films for photovoltaic cell applications deposited by a pulsed DC magnetron sputtering with a rotating cylindrical target;Vacuum;2012-04
3. Chemical Activity of Oxygen Atoms in the Magnetron Sputter-Deposited ZnO Films During Film Growth;Journal of Nanoscience and Nanotechnology;2011-09-01
4. Chemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film Growth;Japanese Journal of Applied Physics;2011-08-22
5. Chemical activity of oxygen atoms in the magnetron sputter-deposited ZnO films;Thin Solid Films;2011-08
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