Scanning photoemission microscopy on MAXIMUM reaches 0.1 micron resolution-Reference-Cited by-同舟云学术

Scanning photoemission microscopy on MAXIMUM reaches 0.1 micron resolution

Published:1993-05 Issue: Volume:287-288 Page:1046-1050
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Capasso C.,Ng W.,Ray-Chaudhuri A.K.,Liang S.H.,Cole R.K.,Guo Z.Y.,Wallace J.,Cerrina F.,Underwood J.,Perera R.,Kortright J.,De Stasio G.,Margaritondo G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference27 articles.

1. MAXIMUM: Status of the scanning photoelectron microscope (abstract)

2. The photoemission spectromicroscope multiple‐application x‐ray imaging undulator microscope (maximum)

3. Photoemission spectromicroscopy with MAXIMUM at Wisconsin

4. High‐resolution x‐ray microscopy using an undulator source, photoelectron studies with MAXIMUM

5. Scanning photoelectron microscopy with undulator radiation: A successful test on uncoated neurons

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photoelectron spectromicroscopy and spectronanoscopy at synchrotrons: Growing impact on life sciences and materials science;Journal of Electron Spectroscopy and Related Phenomena;2010-05

2. Cathode Lens Spectromicroscopy with a Low-Energy Electron Microscope;X-Ray Microscopy and Spectromicroscopy;1998

3. An Improved Microprobe Using Direct Undulator Radiation;X-Ray Microscopy and Spectromicroscopy;1998

4. PISAM: a photon-induced scanning Auger microscope;Journal of Electron Spectroscopy and Related Phenomena;1997-03

5. Quantitative surface analysis by Auger and x-ray photoelectron spectroscopy;Progress in Surface Science;1996-08