Field ion microscope studies of very low coverage low temperature oxygen adsorption on tungsten-Reference-Cited by-同舟云学术

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Field ion microscope studies of very low coverage low temperature oxygen adsorption on tungsten

Published:1972-08 Issue:2 Volume:32 Page:397-421
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Cranstoun G.K.L.,Anderson J.S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference36 articles.

1. CHEMICAL REACTIONS AT VERY LOW PRESSURES. I. THE CLEAN-UP OF OXYGEN IN A TUNGSTEN LAMP.

2. CHEMICAL REACTIONS AT LOW PRESSURES.1

3. OXYGEN FILMS ON TUNGSTEN. I. A STUDY OF STABILITY BY MEANS OF ELECTRON EMISSION IN PRESENCE OF CESIUM VAPOR

4. Structure and Properties of Thin Films;Müller,1959

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