The production of heavy multiply charged ions in secondary ion mass spectrometry-Reference-Cited by-同舟云学术

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The production of heavy multiply charged ions in secondary ion mass spectrometry

Published:1993-01 Issue:1-2 Volume:280 Page:208-216
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

van der Heide P.A.W.,Metson J.B.,Tui D.L.,Lau W.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference21 articles.

1. Émission ionique secondaire des alliages cuivre-aluminium en présence d'oxygène

2. Sur la formation retardée d'ions a l'extérieur d'une cible soumise à un bombardement ionique

3. Quantitative analysis using sputtered neutrals in a secondary ion microanalyser

4. Intrinsic emission of secondary ions from silver-magnesium alloys

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. References;Secondary Ion Mass Spectrometry;2014-08-22

2. Secondary Ion Mass Spectrometry;2014-08-18

3. Gas-phase ionisation of sputtered rare gas atoms;International Journal of Mass Spectrometry;2008-01

4. Multiply charged Al recoils with impact of 2.0keV Si+ ions;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2007-07

5. Formation of multiply charged Al ions by direct recoil;Physical Review B;2006-04-19

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