The activation energy for surface self-diffusion of tantalum and the influence of residual gases on this quantity in the presence of high electric fields-Reference-Cited by-同舟云学术

The activation energy for surface self-diffusion of tantalum and the influence of residual gases on this quantity in the presence of high electric fields

Published:1974-05 Issue:1 Volume:43 Page:21-28
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Wang J.L.,Vanselow R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference29 articles.

1. Modern Diffraction and Imaging Techniques in Material Science;Müller,1970

2. Surface Self-Diffusion of Metals;Neumann,1972

3. Consideration of the bulk impurity effect in surface self-diffusion measurements

4. Surfaces and Interfaces. I. Chemical and Physical Characteristics;Gjostein,1967

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