ArF excimer laser induced changes in the Si(100)/SiO2 interface studied in situ by ESCA and LEED-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

ArF excimer laser induced changes in the Si(100)/SiO2 interface studied in situ by ESCA and LEED

Published:1989-12 Issue:1-4 Volume:43 Page:297-300
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kubátová J.,Cháb V.,Lukeš I.,Jiříček P.,Fendrych F.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference4 articles.

1. The Physics of SiO2 and Its Interfaces;Pantelides,1978

2. 3rd Intern. Conf. on Trends in Quantum Electronics;Lukeš,1988

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. KrF-excimer-laser-induced native oxide removal from Si (100) surfaces studied by Auger electron spectroscopy;Applied Physics A Materials Science and Processing;1996-02

2. Excimer laser cleaning of Si(100) surfaces at 193 and 248 nm studied by LEED, AES and XPS spectroscopies;Journal of Electron Spectroscopy and Related Phenomena;1995-12

3. Nonequilibrium solidification of monocrystalline Si induced by ArF-excimer-laser irradiation;Thermochimica Acta;1993-05

4. Excimer-laser-induced melting and solidification of monocrystalline Si: Equilibrium and nonequilibrium models;Physical Review B;1991-09-01

5. Electronic and crystalline structure of Si/SiO2 interface modified by ArF excimer laser;Progress in Surface Science;1990-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP