Diffusion of group III and V elements in SiO2
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference47 articles.
1. SUPREM III — A Program for IC Process Modelling and Simulation;Ho,1983
2. Diffusivity Summary of B, Ga, P, As, and Sb in SiO[sub 2]
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4. Ion Implantation and Annealing Effects in SiO[sub 2] Layers on Silicon Studied by Optical Measurements
5. Stoichiometric disturbances in ion implanted compound semiconductors
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