Growth of silicon microcrystals in thin surface layers of quartz glass with vacuum ultraviolet laser processing

Author:

Kurosawa Kou,Sasaki Wataru,Takigawa Yasuo,Ohmukai Masato,Katto Masahito,Okuda Masahiro

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Nucleation and Cluster Formation;Laser Processing and Chemistry;2011

2. FORMATION OF SILICON NANOCRYSTALS AND INTERFACE ISLANDS IN SYNCHROTRON-RADIATION-IRRADIATED SiO2 FILMS ON Si(100);International Journal of Modern Physics B;2001-12-10

3. Formation of Si–Si bonds and precipitation of Si nanocrystals in vacuum-ultraviolet-irradiated a-SiO[sub 2] films;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2001

4. Excimer laser irradiation of Si3N4 films deposited on Si;Journal of Applied Physics;1998-04

5. Temperature dependence of silicon precipitation in thin surface layer of Si3N4 induced by excimer laser irradiation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1996-08

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