Kinetics and mechanisms of CW laser induced deposition of metals for microelectronics-Reference-Cited by-同舟云学术

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Kinetics and mechanisms of CW laser induced deposition of metals for microelectronics

Published:1989-12 Issue:1-4 Volume:43 Page:47-53
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Auvert Geoffroy

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference28 articles.

1. Emerging Technologies for In-Situ Processing;Auvert,1988

2. Laser Processing and Diagnostic;Pauleau,1984

3. Laser-Enhanced Plating and Etching: Mechanisms and Applications

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1. Laser chemical vapour deposition: materials, modelling, and process control;International Materials Reviews;2001-06

2. The adsorption of nickelocene;Surface Science;1998-12

3. Variations on Nickel Complexes of the vic-Dioximes: An Understanding of Factors Affecting Volatility toward Improved Precursors for Metal−Organic Chemical Vapor Deposition of Nickel;Chemistry of Materials;1998-08-13

4. Evaluation of (.eta.5-C5H5)(CO)Ni-In[(CH2)3N(CH3)2]2 as a Single-Molecule Precursor for OMCVD of Binary Ni/In alloys; Deposition of Phase-Pure Polycrystalline .epsilon.-NiIn;Chemistry of Materials;1995-10-01

5. Laser chemical vapour deposition for microelectronics;Applied Surface Science;1995-02

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