The photolytic laser chemical vapor deposition rate of platinum, its dependence on wavelength, precursor vapor pressure, light intensity, and laser beam diameter-Reference-Cited by-同舟云学术

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The photolytic laser chemical vapor deposition rate of platinum, its dependence on wavelength, precursor vapor pressure, light intensity, and laser beam diameter

Published:1990-12 Issue:1-4 Volume:46 Page:9-18
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Braichotte D.,Garrido C.,van den Bergh H.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference22 articles.

1. Chemical Processing with Lasers, Vol. 1 of Springer Series in Materials Sciences;Bäuerle,1986

2. A review of laser–microchemical processing

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