Laser-induced etching and deposition of tungsten in WF6-H2 atmosphere-Reference-Cited by-同舟云学术

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Laser-induced etching and deposition of tungsten in WF6-H2 atmosphere

Published:1995-02 Issue:1-4 Volume:86 Page:484-487
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Piglmayer K.,Toth Z.,Kantor Z.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference18 articles.

1. Laser Controlled Chemical Processing of Surfaces,1984

2. Chemical Processing with Lasers;Bäuerle,1986

3. Laser Processing of Thin Films and Microstructures;Boyd,1987

4. Laser Microfabrication — Thin Film Processes and Lithography,1989

5. Laser and Particle Beam Chemical Processes on Surfaces,1989

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Formation of Complex Tungsten-Silica Microstructures by Ar[sup +] Laser Processing;Electrochemical and Solid-State Letters;2004

2. Laser-induced etching of tungsten and fused silica in WF6;Applied Surface Science;2003-03

3. Laser-induced local CVD and simultaneous etching of tungsten;Applied Surface Science;2002-01

4. Laser-induced etching of tungsten;Applied Surface Science;1997-02

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