Determination of etching characteristics of a vacuum generators AG21 argon-ion gun by interference colour and ellipsometric assessment of craters etched in tantalum oxide films-Reference-Cited by-同舟云学术

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Determination of etching characteristics of a vacuum generators AG21 argon-ion gun by interference colour and ellipsometric assessment of craters etched in tantalum oxide films

Published:1990-10 Issue:3 Volume:45 Page:263-274
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Treverton J.A.,Rosenfeld A.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference7 articles.

1. A simple device for measuring the flux distribution in scanned ion and neutral beams for sputter depth profiling of solid surfaces

2. An analysis of the crater formed on a surface by argon ion bombardment

3. Measurement of the sputtering yield with a 3d stylus surface mapping system: application to copper and α-brass

4. Simple Technique for Examination of Sputtering Patterns

5. The optical properties of thin oxide films on tantalum

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Wet and Dry Etching Materials;Handbook of Chemicals and Gases for the Semiconductor Industry;2002-07-15

2. Ion Beam Modification of InSe Surfaces;Surface and Interface Analysis;1997-02

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