Author:
Jongste J.F.,Oosterlaken T.G.M.,Leusink G.J.,van der Jeugd C.A.,Janssen G.C.A.M.,Radelaar S.
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference8 articles.
1. Selective Low Pressure Chemical Vapor Deposition of Tungsten
2. Tungsten and Other Refractory Metals for VLSI Applications III;Kusumoto,1988
3. A thermodynamic and kinetic study of chemical vapor deposition of tungsten from WF6and GeH4
4. Tungsten and Other Refractory Metals for VLSI Applications III;Yu,1998
5. Chemical Vapor Deposition of Tungsten and Tungsten Silicides;Schmitz,1991
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献