Rapid thermal nitridation of thin chromium films-Reference-Cited by-同舟云学术

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Rapid thermal nitridation of thin chromium films

Published:1995-12 Issue:4 Volume:90 Page:455-463
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Russell S.W.,Li Jian,Alford T.L.,Oakey P.R.,Shatas S.C.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference27 articles.

1. A Study of Electrical, Metallurgical, and Mechanical Behaviors of Rapid Thermal Processed Ti Films in NH 3

2. D. Adams, N.D. Theodore, S.W. Russell, R.L. Spreitzer, T.L. Alford and J.W. Mayer, Thin Solid Films, in press.

3. Characterization of thick chromium-carbon and chromium-nitrogen films deposited by hollow cathode discharge

4. The development of high performance, low cost solar-selective absorbers

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1. Structural Characteristics by Nitridation of Oxygen Added Cr Thin Films in NH₃ Atmosphere;Korean Journal of Materials Research;2021-11-30

2. Diffusion characteristics of plasma nitrided hard chromium on AISI 1010 steel;MATER TEST;2015

3. Diamond CVD film formation onto WC–Co substrates using a thermally nitrided Cr diffusion-barrier;Diamond and Related Materials;2013-10

4. XPS study of BNx nanolayers prepared by low pressure rapid thermal annealing in ammonia;Journal of Physics: Conference Series;2008-05-01

5. Effects of interfacial layer structures on crystal structural properties of ZnO films;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2008-01

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