Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium-Reference-Cited by-同舟云学术

Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium

Published:1996-04 Issue: Volume:96-98 Page:50-54
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Antoni F.,Fuchs C.,Fogarassy E.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference10 articles.

1. Laser Ablation for Materials Synthesis,1990

2. Laser Ablation: Mechanisms and Applications,1991

3. Laser Ablation of Electronic Materials: Basic Mechanisms and Applications,1992

4. Laser Ablation in Materials Processing: Fundamental and Applications,1993

5. High-Temperature Superconductors: Fundamental Properties and Novel Materials Processing;Fuchs,1990

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