Microwave multipolar plasma for etching and deposition
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference28 articles.
1. Plasma confinement with spherical multipole magnetic field
2. Spherical Multipole Magnets for Plasma Research
3. New application for multipolar plasmas: High‐temperature treatment of materials
4. Structural and electrical properties of silicon nitride films prepared by multipolar plasma‐enhanced deposition
5. NEW HIGH INTENSITY ION SOURCE WITH VERY LOW EXTRACTION VOLTAGE
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1. Effect of CH/C2 Species Density on Surface Morphology of Diamond Film Grown by Microwave Plasma Jet Chemical Vapor Deposition;MATERIALS TRANSACTIONS;2008
2. Methods/Principles of Deposition and Etching of Thin Films;Handbook of Semiconductor Interconnection Technology, Second Edition;2006-02-22
3. Sheath Width in Negative-Ion-Containing Plasma;Japanese Journal of Applied Physics;1993-11-15
4. Generation of Cold Plasma;Film Deposition by Plasma Techniques;1992
5. On the Control of Diamond Deposition Structure and Morphology;Journal of The Electrochemical Society;1991-10-01
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