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Initial stages of aluminum epitaxy on the Si(111)√3×√3-Al surface studied by electron-energy-loss spectroscopy

  • Published:1990-01 Issue: Volume:41-42 Page:118-122
  • ISSN:0169-4332
  • Container-title:Applied Surface Science
  • language:en
  • Short-container-title:Applied Surface Science

Author:

Li Sung-Te,Hasegawa Shigehiko,Yamashita Nobuhisa,Nakashima Hisao

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface plasmon excitation at metal surfaces studied by reflection high-energy positron diffraction;Journal of Physics: Conference Series;2010-04-01

2. Surface Plasmon Excitation at Topmost Surface in Reflection High-Energy Positron Diffraction;e-Journal of Surface Science and Nanotechnology;2010

3. Al Growth on $\bf Si(111)(\sqrt {3}\times \sqrt {3})\mbox{-}Ga$ Surfaces at Room Temperature;Japanese Journal of Applied Physics;1995-02-28

4. Chemical vapor deposition of Al from dimethylethylamine alane on GaAs(100)c(4×4) surfaces;Journal of Applied Physics;1994-09-15

5. References, metals on semiconductors;Adsorbed Layers on Surfaces. Part 1: Adsorption on Surfaces and Surface Diffusion of Adsorbates
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