Optimal thermal actuation for mirror temperature control-Reference-Cited by-同舟云学术

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Optimal thermal actuation for mirror temperature control

Published:2022-08 Issue: Volume:398 Page:115212
ISSN:0045-7825
Container-title:Computer Methods in Applied Mechanics and Engineering
language:en
Short-container-title:Computer Methods in Applied Mechanics and Engineering

Author:

Veldman D.W.M.^ORCID,Nouwens S.A.N.^ORCID,Fey R.H.B.^ORCID,Zwart H.J.^ORCID,van de Wal M.M.J.,van den Boom J.D.B.J.,Nijmeijer H.

Funder

Technische Universiteit Eindhoven

Publisher

Elsevier BV

Subject

Computer Science Applications,General Physics and Astronomy,Mechanical Engineering,Mechanics of Materials,Computational Mechanics

Reference32 articles.

1. Principles of Lithography;Levinson,2010

2. Extreme Ultra Violet (EUV) lithography;Zeiss,2020

3. Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus;Bittner,2012

4. Optics for ASML’s NXE:3300B platform;Lowisch,2013

5. High-NA EUV imaging: challenges and outlook;Bilski,2019

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3. Adjoint-based optimal control of contractile elastic bodies. Application to limbless locomotion on frictional substrates;Computer Methods in Applied Mechanics and Engineering;2024-02

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