Growth, structural and optical properties of copper indium diselenide thin films deposited by thermal evaporation method
Author:
Publisher
Elsevier BV
Subject
General Materials Science,Renewable Energy, Sustainability and the Environment
Reference37 articles.
1. Broad band spectroscopic ellipsometry for the characterization of photovoltaic materials;Abou-Elfotouh;Solar cells,1991
2. Structural and optical characterization of CuInSe2 films deposited by hot wall vacuum evaporation method;Agilan;Vacuum,2007
3. Synthesis and material properties of Cu-III-VI2 chalcopyrite thin films;Aissaoui;J. Phys. D: Appl. Phys.,2007
4. Structural study of flash-evaporated CuInSe2 thin films;Akl;Vacuum,2001
5. Growth, microstructure, optical and electrical properties of sprayed CuInSe2 polycrystalline films;Alaa;Mater. Res. Bull.,2008
Cited by 35 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Growth and characterization of strontium tartrate tetrahydrate and zinc doped strontium tartrate tetrahydrate crystal;Chemical Data Collections;2023-06
2. Analysis of hybrid-deposited CI(G)Se thin films and theoretical modeling of their properties through SCAPS-1D software;Materials Today Communications;2023-03
3. Synthesis and characterization of strontium tartrate tetrahydrate crystal using silica gel method;Materials Today: Proceedings;2023-02
4. Impact of substrate temperature on structural, morphological and optical properties of In2S3 thin films deposited on ITO/glass substrate by spray pyrolysis technique;Indian Journal of Physics;2022-01-17
5. Pre-deposited alkali (Li, Na, K) chlorides layer for effective doping of CuInSSe thin films as absorber layer in solar cells;Solar Energy;2022-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3