Direct patterned etching of silicon dioxide and silicon nitride dielectric layers by inkjet printing-Reference-Cited by-同舟云学术

Direct patterned etching of silicon dioxide and silicon nitride dielectric layers by inkjet printing

Published:2009-10 Issue:10 Volume:93 Page:1865-1874
ISSN:0927-0248
Container-title:Solar Energy Materials and Solar Cells
language:en
Short-container-title:Solar Energy Materials and Solar Cells

Author:

Lennon Alison J.,Ho-Baillie Anita W.Y.,Wenham Stuart R.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference31 articles.

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5. M. Bähr, S. Kim, S. Sridharan, C. Khadilkar, A. Shaikh, I. Köhler, M. Reichardt, M. Kumar, A new approach for front side metallisation of industrial type silicon solar cells using a structurization by etching, in: Proceedings of the 22nd European Photovoltaic Solar Energy Conference, Milan, Italy, 2007, pp. 1015–1019.

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