A method to slow down the etching of hydrogen plasma pretreatment and improve passivation in silicon heterojunction solar cells-Reference-Cited by-同舟云学术

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A method to slow down the etching of hydrogen plasma pretreatment and improve passivation in silicon heterojunction solar cells

Published:2024-12 Issue: Volume:278 Page:113158
ISSN:0927-0248
Container-title:Solar Energy Materials and Solar Cells
language:en
Short-container-title:Solar Energy Materials and Solar Cells

Author:

Li Jianming,Liu Ziyuan,Tao Ke,Li Wei,Yan Baojie,Yang Baohai,Bi Jinlian,Xing Yupeng,Yuan Yujie

Funder

National Outstanding Youth Science Fund Project of National Natural Science Foundation of China

Tianjin Research Innovation Project for Postgraduate Students

Publisher

Elsevier BV

Reference25 articles.

1. Optoelectrical analysis of TCO+ Silicon oxide double layers at the front and rear side of silicon heterojunction solar cells;Cruz;Sol. Energy Mater. Sol. Cell.,2022

2. Front contact optimization for rear-junction HJT solar cells with ultra-thin n-type nanocrystalline silicon oxide;Qiu;Sol. Energy Mater. Sol. Cell.,2020

3. High-efficiency a-Si/c-Si heterojunction solar cell;Sawada;IEEE,1994

4. Ultra-thin nanocrystalline n-type silicon oxide front contact layers for rear emitter silicon heterojunction solar cells;Mazzarella;Sol. Energy Mater. Sol. Cell.,2018

5. Nanocrystalline silicon emitter optimization for Si‐HJ solar cells: substrate selectivity and CO2 plasma treatment effect;Mazzarella;Physica status solidi (a),2017

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