Excimer laser annealing and chemical texturing of ZnO:Al sputtered at room temperature for photovoltaic applications

Author:

Johnson E.V.,Prod'homme P.,Boniface C.,Huet K.,Emeraud T.,Roca i Cabarrocas P.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells;Kluth;Thin Solid Films,1999

2. Efforts to improve carrier mobility in radio frequency sputtered aluminum doped zinc oxide films;Agashe;J. Appl. Phys.,2004

3. Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour;Kluth;Thin Solid Films,2003

4. O. Kluth, A. Loffl, S. Wieder, et al., Texture etched Al-doped ZnO: a new material for enhanced light trapping in thin film solar cells, Proceedings of the 26th IEEE Photovoltaic Specialists Conference, Anaheim, 1997, pp. 715–718.

5. Rough ZnO layers by LP-CVD process and their effect in improving performances of amorphous and microcrystalline silicon solar cells;Fay;Sol. Energy Mater. Sol. Cells,2006

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