Development of industrial processes for the fabrication of high efficiency n-type PERT cells

Author:

Blévin Thomas,Lanterne Adeline,Grange Bernadette,Cabal Raphaël,Vilcot J.P.,Veschetti Yannick

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Recombination activity of interstitial iron and other transition metal point defects in p and n-type crystalline silicon;Macdonald;Appl. Phys. Lett.,2004

2. J.E. Cotter et al., p-Type vs. n-type silicon wafers: prospects for high-efficiency, commercial silicon solar cells, in: Proceedings of the 15th Workshop on Crystalline Silicon Solar Cells & Modules: Materials and Processes, 2005.

3. Base doping and recombination activity of impurities in crystalline silicon solar cells;Geerligs;Prog. Photovolt.: Res. Appl.,2004

4. J. Zhao et al., High efficiency PERT cells on n-type silicon substrates, in: Proceedings of the 29th IEEE, 2002, p. 218.

5. Fully ion implanted and coactivated industrial n-type cells with 20.5% efficiency;Boscke;IEEE J. Photovolt.,2013

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