Dielectric properties of DC reactive magnetron sputtered Al2O3 thin films-Reference-Cited by-同舟云学术

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Dielectric properties of DC reactive magnetron sputtered Al2O3 thin films

Published:2012-01 Issue:7 Volume:520 Page:2689-2694
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

S. Prasanna,G. Mohan Rao,S. Jayakumar,M.D. Kannan,V. Ganesan

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference34 articles.

1. Structural and optical properties of γ-alumina thin films prepared by pulsed laser deposition

2. Thermal stability of alumina thin films containing γ-Al2O3 phase prepared by reactive magnetron sputtering

3. Characterization of Al2O3 thin films prepared by spray pyrolysis method for humidity sensor

4. Electrical properties of amorphous aluminum oxide thin films

5. Built-in interface in high-κ gate stacks

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