Author:
Widodo J.,Lu W.,Mhaisalkar S.G.,Hsia L.C.,Tan P.Y.,Shen L.,Zeng K.Y.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference14 articles.
1. Technical Digest of International Electronic Device Meeting Conference;Bohr,1995
2. Dielectric for VLSI/ULSI Multilayer Interconnect Conference, Santa Clara;Matsuki,2000
3. Properties of low-k SiCOH films prepared by plasma-enhanced chemical vapor deposition using trimethylsilane
Cited by
20 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献