Driving up the quality of metal organic chemical vapor deposition-grown epitaxial wafers for highly innovative photonic applications

Author:

Pasternak I.,Kolkowski W.,Jureńczyk J.,Matuszelański K.,Strupinski W.

Funder

Arizona State University

Narodowe Centrum Badań i Rozwoju

Uniwersytet Śląski w Katowicach

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

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3. Dark current analysis and characterization of InxGa1-xAs/InAsyP1-y graded photodiodes with x >0.53 for response to longer wavelength (>1.7 µm);Linga;J. Light. Technol.,1992

4. Near-infrared (1–3 µm) InGaAs detectors and arrays: crystal growth, leakage current and reliability;Joshi,1993

5. Extended short wavelength infrared FPA technology: status and trends;Besikci;OPTO,2018

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