Optical emission spectroscopy as a process control tool during plasma enhanced chemical vapor deposition of microcrystalline silicon thin films-Reference-Cited by-同舟云学术

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Optical emission spectroscopy as a process control tool during plasma enhanced chemical vapor deposition of microcrystalline silicon thin films

Published:2012-03 Issue:11 Volume:520 Page:3999-4002
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Du C.C.,Wei T.C.,Chang C.H.,Lee S.L.,Liang M.W.,Huang J.R.,Wu C.H.,Shirakura A.,Morisawa R.,Suzuki T.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, May 11–18;Vanecek,2003

2. Microcrystalline silicon and ‘micromorph’ tandem solar cells

3. Recent progress in micromorph solar cells

4. New materials and deposition techniques for highly efficient silicon thin film solar cells

5. Phase engineering of a-Si:H solar cells for optimized performance

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Efficiency of silane gas generation in high-rate silicon etching by narrow-gap microwave hydrogen plasma;Journal of Physics D: Applied Physics;2015-12-09

2. Atomic spectrometry update. Review of advances in the analysis of metals, chemicals and materials;Journal of Analytical Atomic Spectrometry;2013

3. Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy;Acta Physica Sinica;2013

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