Scattering mechanism of transparent conducting tin oxide films prepared by magnetron sputtering-Reference-Cited by-同舟云学术

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Scattering mechanism of transparent conducting tin oxide films prepared by magnetron sputtering

Published:2006-12 Issue:4 Volume:515 Page:2475-2480
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kim I.H.,Ko J.H.,Kim D.,Lee K.S.,Lee T.S.,Jeong J.-h.,Cheong B.,Baik Y.-J.,Kim W.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. Optical and electrical properties of radio frequency sputtered tin oxide films doped with oxygen vacancies, F, Sb, or Mo

2. Highly Conducting and Transparent SnO2Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates

3. Characterization of tin oxide thin films deposited by reactive sputtering

4. Properties of electron-beam-evaporated tin oxide films

5. Growth and characterization of tin oxide films prepared by chemical vapour deposition

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