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Transmission measurements of multilayer interference filters developed for a full integration on Complementary Metal Oxide Semiconductor chips

  • Published:2017-06 Issue: Volume:631 Page:23-28
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Masarotto L.,Frey L.,Charles M.L.,Roule A.,Rodriguez G.,Souil R.,Morales C.,Larrey V.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference21 articles.

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2. A 2.0-μm pixel pitch MOS image sensor with 1.5 transistor/pixel and an amorphous Si color filter;Kasano;IEEE Trans. Electron Devices,2006

3. A high performance single-photon avalanche diode in 130-nm CMOS imaging technology;Webster;IEEE Electron Device Lett.,2012

4. A Wide Dynamic Range Chackered-Color CMOS Image Sensor with IR-cut RGB and Visible-to-Near-IR Pixels;Kawada,2009

5. A day and night vision MOS imager with robust photonic-crystal-based RGB-and-IR;Koyama;IEEE Trans. Electron. Devices,2008

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