Simulation at high temperature of atomic deposition, islands coalescence, Ostwald and inverse Ostwald ripening with a general simple kinetic Monte Carlo code-Reference-Cited by-同舟云学术

Simulation at high temperature of atomic deposition, islands coalescence, Ostwald and inverse Ostwald ripening with a general simple kinetic Monte Carlo code

Published:2010-07 Issue:18 Volume:518 Page:5355-5361
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Lucas S.,Moskovkin P.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. A new algorithm for Monte Carlo simulation of Ising spin systems

2. Kinetic Monte Carlo Simulation of the Growth of Various Nanostructures through Atomic and Cluster Deposition: Application to Gold Nanostructure Growth on Graphite

3. Dependence of morphology of pulsed-laser deposited coatings on temperature: a kinetic Monte Carlo simulation

4. Comparative investigation of the nucleation and growth of fcc-metal particles (Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au) on amorphous carbon and SiO2 substrates during vapor deposition at elevated temperatures

5. Self-learning kinetic Monte Carlo method: Application to Cu(111)

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