Physical properties of an oxide photoresist film for submicron pattern lithography-Reference-Cited by-同舟云学术

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Physical properties of an oxide photoresist film for submicron pattern lithography

Published:2013-09 Issue: Volume:542 Page:409-414
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Chiang Donyau,Chang Chun-Ming,Chen Shi-Wei,Yang Chin-Tien,Hsueh Wen-Jeng

Funder

Taiwan National Science Council

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Reflection properties of nanostructure-arrayed silicon surfaces

2. Broadband antireflection gratings fabricated upon silicon substrates

3. Waveguiding in planar photonic crystals

4. A Radiate Microstructure MALDI Chip for Sample Concentration and Detection

5. The Sub-Micron Hole Array in Sapphire Produced by Inductively-Coupled Plasma Reactive Ion Etching

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Glassy Carbon: A Promising Material for Micro- and Nanomanufacturing;Materials;2018-09-28

2. Dual-photoresist complementary lithography technique for the formation of submicron patterns on sapphire substrates;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-07-22

3. Dual photoresist complimentary lithography technique produces sub-micro patterns on sapphire substrates;SPIE Proceedings;2014-03-31

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