In situ study on the growth of microcrystalline silicon film using the high-density microwave plasma for Si thin film solar cells
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference15 articles.
1. Low Temperature Growth of Amorphous and Polycrystalline Silicon Films from a Modified Inductively Coupled Plasma
2. Fast Deposition of Microcrystalline Silicon Using High-Density SiH4Microwave Plasma
3. Proc. of 16th Symp. on Plasma Sci. for Mater. (Tokyo University, Japan, June 4–5th);Niikira,2003
4. The Generation of High-Density Microwave Plasma and Its Application to Large-Area Microcrystalline Silicon Thin Film Formation
5. Novel High-Density Microwave Plasma Utilizing an Internal Spoke Antenna for Fast Deposition of Microcrystalline Silicon Films
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1. The Study of Microcrystalline Silicon Thin Films Prepared by PECVD;Key Engineering Materials;2013-01
2. Real time and ex situ spectroscopic ellipsometry analysis microcrystalline silicon thin films growth;Acta Physica Sinica;2012
3. Influence of Boron doping on microcrystalline silicon growth;Chinese Physics B;2011-09
4. Diagnostics of the atmospheric pressure plasma jets for plasma enhanced chemical vapor deposition of polycrystalline silicon thin film;Acta Physica Sinica;2010
5. Photovoltaics literature survey (No. 47);Progress in Photovoltaics: Research and Applications;2006
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