Design and fabrication of a novel integrated shadow mask for passive matrix OLDE devices-Reference-Cited by-同舟云学术

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Design and fabrication of a novel integrated shadow mask for passive matrix OLDE devices

Published:2009-07 Issue:17 Volume:517 Page:5280-5283
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Huang Z.H.,Qi G.J.,Zeng X.T.,Lukito D.,Su W.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Semiconductor Integrated Circuit Processing Technology;Runyan,1990

2. M.S. Weaver, M.A. Rothman, T. Zhou, U. S. Patent No. 6596443, 22 July 2003.

3. K. Nagayama, S. Miyaguchi, U. S. Patent No. 5701055, 23 Dec. 1997.

4. P. Burrows, S.R. Forrest, P.F. Tian, U. S. Patent No. 6013538, 11 Jan. 2000.

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