Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology-Reference-Cited by-同舟云学术

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Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology

Published:2015-06 Issue: Volume:584 Page:176-185
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Liu Shiyuan^ORCID,Chen Xiuguo,Zhang Chuanwei

Funder

National Natural Science Foundation of China

National Instrument Development Specific Project of China

China Postdoctoral Science Foundation

Program for Changjiang Scholars and Innovative Research Team in University of China

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference41 articles.

1. Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing;Postek;Proc. SPIE,2007

2. Ellipsometry and Polarized Light;Azzam,1977

3. Specular spectroscopic scatterometry;Niu;IEEE Trans. Semicond. Manuf.,2001

4. Normal-incidence spectroscopic ellipsometry for critical dimension monitoring;Huang;Appl. Phys. Lett.,2001

5. Spectroscopic ellipsometry and reflectometry from gratings (scatterometry) for critical dimension measurement and in situ, real-time process monitoring;Huang;Thin Solid Films,2004

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