Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering-Reference-Cited by-同舟云学术

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Control of the optical properties of silicon and chromium mixed oxides deposited by reactive magnetron sputtering

Published:2011-03 Issue:11 Volume:519 Page:3509-3515
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Vergara L.,Galindo R. Escobar,Martínez R.,Sánchez O.,Palacio C.,Albella J.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference59 articles.

1. Elaboration and characterization of Ti and TiN thin films and multilayers for hard coating applications

2. Thin films comparable with WC-Co cemented carbides as underlayers for hard and superhard coatings: the state of the art

3. Deposition of α-Al2O3 hard coatings by reactive magnetron sputtering

4. The influence of superelastic NiTi interlayers on tribological properties of CrN hard coatings

5. A new solid oxide fuel cell design based on thin film electrolytes

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1. Effect of electron-beam deposition process variables on the film characteristics of the CrOx films;AIP Advances;2018-02

2. ZnxZryOzthin films grown by DC magnetron sputtering;physica status solidi (a);2017-06-28

3. Mixed Ti–O–Si oxide films formation by oxidation of titanium–silicon interfaces;Applied Surface Science;2014-05

4. Growth of Ti–O–Si mixed oxides by reactive ion-beam mixing of Ti/Si interfaces;Journal of Physics D: Applied Physics;2013-12-05

5. High- and low-energy x-ray photoelectron techniques for compositional depth profiles: destructive versus non-destructive methods;Journal of Physics D: Applied Physics;2013-01-17

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