Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition-Reference-Cited by-同舟云学术

Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition

Published:2012-11 Issue: Volume:522 Page:11-16
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

de los Arcos Teresa,Cwik Stefan,Milanov Andrian P.,Gwildies Vanessa,Parala Harish,Wagner Tristan,Birkner Alexander,Rogalla Detlef,Becker Hans-Werner,Winter Jörg,Ludwig Alfred,Fischer Roland A.,Devi Anjana

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Polymer-Laminated Electrochromic Devices Composed of WO[sub 3] and Ni(OH)[sub 2] on Glass and PET Substrates

2. Tungsten trioxide as a photoanode for a photoelectrochemical cell (PEC)

3. The effect of thermal annealing on photoelectrochemical responses of WO3 thin films

4. Facile Preparation of Platelike Tungsten Oxide Thin Film Electrodes with High Photoelectrode Activity

5. Nitrogen doping of nanoporous WO3layers by NH3treatment for increased visible light photoresponse

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