Growth and characteristics of laser deposited anatase and rutile TiO2 films on Si substrates-Reference-Cited by-同舟云学术

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Growth and characteristics of laser deposited anatase and rutile TiO2 films on Si substrates

Published:2008-11 Issue:2 Volume:517 Page:745-749
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Long Hua,Yang Guang,Chen Aiping,Li Yuhua,Lu Peixiang

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Structural, morphological and local electric properties of TiO2thin films grown by pulsed laser deposition

2. A New Benchmark for TiO2 Nanotube Array Growth by Anodization

3. Processing and characterization of TiO2film prepared on glass via pulsed laser deposition

4. Growth, structure, and morphology of TiO2 films deposited by molecular beam epitaxy in pure ozone ambients

5. Effect of oxygen pressure and laser fluence during pulsed laser deposition of TiO2 on MTOS (Metal–TiO2–SiO2–Si) capacitor characteristics

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