Preparation and characterization of indium oxide film by electrochemical deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. Preparation of indium tin oxide films and doped tin oxide films by an ultrasonic spray CVD process
2. Characterization of low‐resistivity indium oxide films by Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and x‐ray diffraction and correlation between their properties, composition, and texture
3. Effect of target‐substrate distance on the growth and properties of rf‐sputtered indium tin oxide films
4. Low resistivity indium–tin oxide transparent conductive films. I. Effect of introducing H2O gas or H2 gas during direct current magnetron sputtering
5. Thin Film Solar Cell;Chopra,1983
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