Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
Author:
Funder
KETEP
KIAT
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference17 articles.
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3. Very low bulk and surface recombination in oxidized silicon wafers;Kerr;Semicond. Sci. Technol.,2002
4. Surface passivation of crystalline and polycrystalline silicon using hydrogenated amorphous silicon oxide film;Sritharathikhun;Jpn. J. Appl. Phys.,2007
5. Bulk and surface passivation of silicon solar cells accomplished by silicon nitride deposited on industrial scale by microwave PECVD;Soppe;Prog. Photovolt: Res. Appl.,2005
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