Author:
Li Yanrui,Deng Songwen,Li Gang,Li Juntao,Lv Qipeng,Jin Yuqi
Funder
National Key Research and Development Program of China
Reference28 articles.
1. Development of hafnium based high-k materials—A review;Choi;Mater. Sci. Eng.: R: Reports,2011
2. Enhanced ferroelectricity in ultrathin films grown directly on silicon;Cheema Suraj;Nature,2020
3. Negres Raluca A. Ten-year summary of the Boulder Damage Symposium annual thin film laser damage competition;Stolz Christopher;Opt. Eng.,2018
4. Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications;Gusev;Microelectron. Eng.,2003
5. Antireflection coating with consistent near-neutral color on complex-shaped substrates prepared by ALD;Kristin;Opt. Lett.,2019