Microstructure of ZnO thin films deposited by high power impulse magnetron sputtering

Author:

Reed A.N.,Shamberger P.J.,Hu J.J.,Muratore C.,Bultman J.E.,Voevodin A.A.

Funder

Air Force Office of Scientific Research Aerospace Materials for Extreme Environments

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference46 articles.

1. Zinc Oxide Thin-Film Transistors: An Investigation of the Performance and Stability of Zinc Oxide Thin-Film Transistors and the Role of High-k Dielectrics;Khan,2011

2. ZnO devices and applications: A review of current status and future prospects;Ozgur;Proc. IEEE,2010

3. A comprehensive review of ZnO materials and devices;Ozgur;J. Appl. Phys.,2005

4. Growth of c-axis oriented ZnO thin films with high deposition rate on silicon by CVD method;Shimizu;J. Cryst. Growth,1982

5. ZnO thin films prepared by remote plasma-enhanced CVD method;Haga;J. Cryst. Growth,2000

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