Insertion of nanocrystalline diamond film and the addition of hydrogen gas during deposition for adhesion improvement of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method-Reference-Cited by-同舟云学术

Insertion of nanocrystalline diamond film and the addition of hydrogen gas during deposition for adhesion improvement of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method

Published:2013-05 Issue: Volume:534 Page:380-383
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Ko J.-S.,Park J.-K.,Lee W.-S.,Huh J.-Y.,Baik Y.-J.

Funder

Korea Institute of Science and Technology

Ministry of Knowledge Economy

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Boron containing combination tool coatings—characterization and application tests

2. Variation of residual stress in cubic boron nitride film caused by hydrogen addition during unbalanced magnetron sputtering

3. Effect of hydrogen addition on the residual stress of B–C–N films with cubic boron nitride phase prepared by r.f. magnetron sputtering of a B4C target

4. Magnetron-sputtered superhard materials

5. E.-S. Lee, J-K. Park, W.-S. Lee, T.-Y. Seong, Y.-J. Baik, Met. Mater. Int. (in press).

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2. Thick c-BN films deposited by radio frequency magnetron sputtering in argon/nitrogen gas mixture with additional hydrogen gas;Chinese Physics B;2016-09-23