Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Ar-Reference-Cited by-同舟云学术

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Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Ar

Published:2017-11 Issue: Volume:642 Page:36-40
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Greczynski G.^ORCID,Zhirkov I.,Petrov I.,Greene J.E.,Rosen J.

Funder

Swedish Research Council

Åforsk Foundation

Swedish Government Strategic Research Area in Materials Science on Functional Materials at Linköping University

Knut and Alice Wallenberg Foundation

Carl Tryggers Stiftelse för Vetenskaplig Forskning

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. A novel pulsed magnetron sputter technique utilizing very high target power densities;Kouznetsov;Surf. Coat. Technol.,1999

2. Flash post-discharge emission in a reactive HiPIMS process;Loquai;Appl. Phys. Lett.,2016

3. A high power impulse magnetron sputtering model to explain high deposition rate magnetic field configurations;Raman;J. Appl. Phys.,2016

4. Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers;Hippler;J. Appl. Phys.,2017

5. Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS);Anders;J. Appl. Phys.,2017

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1. Superhard oxidation-resistant Ti1-xAlxBy thin films grown by hybrid HiPIMS/DCMS co-sputtering diboride targets without external substrate heating;Materials & Design;2024-02

2. Cross-ionization of the sputtered flux during hybrid high power impulse/direct-current magnetron co-sputtering;Journal of Vacuum Science & Technology A;2024-01-26

3. Effect of Mo content on the microstructure and mechanical properties of CoCrFeNiMox HEA coatings deposited by high power impulse magnetron sputtering;Surface and Coatings Technology;2024-01

4. Towards lowering energy consumption during magnetron sputtering: Benefits of high-mass metal ion irradiation;Journal of Applied Physics;2023-10-09

5. Improving the crystallinity and texture of oblique-angle-deposited AlN thin films using reactive synchronized HiPIMS;Surface and Coatings Technology;2023-09

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