Atomic layer deposition of high-k dielectrics on carbon nanoparticles-Reference-Cited by-同舟云学术

Atomic layer deposition of high-k dielectrics on carbon nanoparticles

Published:2013-07 Issue: Volume:538 Page:16-20
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Tamm Aile,Peikolainen Anna-Liisa,Kozlova Jekaterina,Mändar Hugo,Aidla Aleks,Rammula Raul,Aarik Lauri,Roosalu Kaspar,Lu Jun,Hultman Lars,Koel Mihkel,Kukli Kaupo,Aarik Jaan

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Graphene Versus Carbon Nanotubes in Electronic Devices

2. Efficient management for large-scale flash-memory storage systems with resource conservation

3. Analysis of chemical vapour deposited diamond films by X-ray photoelectron spectroscopy

4. Preparation of carbon aerogels from 5-methylresorcinol–formaldehyde gels

5. Preparation of the Catalyst Support from the Oil-Shale Processing By-Product

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