Formation of atomically flat β-FeSi2/Si(100) interface using ion irradiated substrate
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. Effect of surface treatment of Si substrate on the crystal structure of FeSi2 thin film formed by ion beam sputter deposition method
2. Cross-sectional Transmission Electron Microscopy of Interface Structure of β-FeSi2/Si(100) Prepared by Ion Beam Sputter Deposition
3. Sputter etching effect of the substrate on the microstructure of β-FeSi2 thin film prepared by ion beam sputter deposition method
4. Enhancement of photoresponse properties of β-FeSi2/Si heterojunctions by Al doping
5. Transmission electron microscope analysis of epitaxial growth processes in the sputtered β-FeSi2/Si(001) films
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