Remote plasma chemical vapor deposition of silicon oxycarbide film with a styrene-containing precursor and in situ O2 plasma treatment-Reference-Cited by-同舟云学术

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Remote plasma chemical vapor deposition of silicon oxycarbide film with a styrene-containing precursor and in situ O2 plasma treatment

Published:2024-06 Issue: Volume:798 Page:140384
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kim Eungju,Bak Juni,Jeon Hyeongtag^ORCID

Funder

Merck KGaA

Publisher

Elsevier BV

Reference38 articles.

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4. The lost history of the transistor;IEEE Spectr.,2004

5. Moore's law: past, present and future;Schaller;IEEE Spectr.,1997

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